Unit for Nanocharacterization Equipment and Techniques XPS
X-Ray Photoelectron and Auger Spectroscope - Axis Ultra
XPS - Overview
XPS - Basics and Tutorials
XPS - Specifications
Basics and Tutorials
XPS is a powerful technique for the detection of variations in
chemical composition and oxidation state. In XPS, soft X-rays (about
1500 eV for our instrument) illuminate a region of the sample being
analyzed, and photolelectrons emanating from it are energy analyzed.
From the energies detected, the elements present and their chemical
state (valence) can be determined. In these energies, only electrons
emitted from atoms near the surface of the sample escape without
losing energy, thus, the technique is very surface sensitive. Subtle
changes in peak positions and shape can yield important information
on changes in surface chemistry, giving the XPS its ability to determine
the elemental composition on the surface of all non-volatile materials
semi-quantitatively (It is sensitive to all elements except H).
Using advanced peak fitting, very rich information can be found
regarding the local oxidation and chemical states of the composing
elements. Depth analysis: XPS is sensitive to the top 5 nm of a
sample, thus it can be used to provide elemental composition as
a function of depth by analyzing a sample while removing surface
layers by ion etching.
Basics of X-ray photoelectron spectroscopy / ESCA:
In the future, we plan to organize lecture courses for those who will be interested in deeper understanding of analytical techniques and instrumentation offered by our center.
For a while, for basic education and principle understanding of the XPS / ESCA, we kindly ask you to use following web resources:
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