Unit for Nanocharacterization Equipment and Techniques XPS

X-Ray Photoelectron and Auger Spectroscope - Axis Ultra

XPS - Overview
XPS - Basics and Tutorials
XPS - Specifications

Basics and Tutorials

XPS is a powerful technique for the detection of variations in chemical composition and oxidation state. In XPS, soft X-rays (about 1500 eV for our instrument) illuminate a region of the sample being analyzed, and photolelectrons emanating from it are energy analyzed. From the energies detected, the elements present and their chemical state (valence) can be determined. In these energies, only electrons emitted from atoms near the surface of the sample escape without losing energy, thus, the technique is very surface sensitive. Subtle changes in peak positions and shape can yield important information on changes in surface chemistry, giving the XPS its ability to determine the elemental composition on the surface of all non-volatile materials semi-quantitatively (It is sensitive to all elements except H). Using advanced peak fitting, very rich information can be found regarding the local oxidation and chemical states of the composing elements. Depth analysis: XPS is sensitive to the top 5 nm of a sample, thus it can be used to provide elemental composition as a function of depth by analyzing a sample while removing surface layers by ion etching.


Basics of X-ray photoelectron spectroscopy / ESCA: In the future, we plan to organize lecture courses for those who will be interested in deeper understanding of analytical techniques and instrumentation offered by our center. For a while, for basic education and principle understanding of the XPS / ESCA, we kindly ask you to use following web resources:

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